• Exhibition: September 12 – 15, 2016; Workshop: September 12, 2016
  • Swisstech Convention Centre, Lausanne, Switzerland
  • Please visit our booth and join the workshop at Room 2A
  • 參加部門: Advance Semiconductor Test
R&S / MPI Workshop: Cutting-Edge Modeling and Measurement Techniques Addressing Challenges of 5G Circuits and Systems
This workshop is held in corporation with Rohde & Schwarz.

[Subject]:Wafer-Level Calibration and Measurements at mm-Wave Frequencies
[Abstract]:Accurate calibration of the entire wafer-level measurement system to the RF probe tip end or to the intrinsic device terminals is a critical success factor for extracting trustable device model parameters and characterizing true performance of a RF IC. This presentation will start with the basics of S-parameter measurement and calibration techniques at the wafer-level. Special attention will be paid to how to choose the right calibration method for specific measurement application needs. Finally, the potential sources of calibration residual errors will be analyzed. Practical examples will be given on how to minimize the impact of such errors on the measurement accuracy of a calibrated probe system.
[Presenter]:Dr. Andrej Rumiantsev
[Time]:10:40 – 11:30, Monday, September 12, 2016